Keywords: Furnace bank in the Nanofab (5887268799).jpg These high temperature furnaces are used to grow thin oxide layers on silicon wafers dope the wafers with boron or phosphorus and anneal the wafers Copyright Robert Rathe This image may be used for any NIST purpose Correct photo credit must be provided Other organizations may use this image without charge for editorial articles that mention NIST in accompanying text or a caption Correct photo credit must be provided Stock art use requires permission and may require payment to the photographer To receive a high resolution version send an email with the image AV number and title to inquiries nist gov https //www flickr com/photos/usnistgov/5887268799/ Furnace bank in the Nanofab 2011-06-30 06 44 https //www flickr com/people/63059536 N06 National Institute of Standards and Technology PD-USGov National Institute of Standards and Technology https //flickr com/photos/63059536 N06/5887268799 2016-09-07 02 35 30 United States Government Work Uncategorized 2016 October 21 |